Vapor Delivery Controllers
Vapor Delivery Controllers
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1150C Heated Pressure-Based Mass Flow Controller
Sonic Flow for High Temperature Operation up to 150 degrees C
The 1150C Heated Pressure-Based Mass Flow Controller using viscous flow through a choked orifice is a pressure-based measurement and control system designed to meter and control vapor from low vapor pressure liquid and solid sources directly, without the need of a carrier gas.
The 1150C consists of a fixed flow element and one capacitance manometer for flow measurement, with a proportioning solenoid control valve for flow control (U.S. Patent No. 4,679,585). The 1150C is contained within a compact temperature-controlled assembly with a temperature status LED and relay to indicate when temperature is in range.
The 1150C Heated Pressure-Based Mass Flow Controller using viscous flow through a choked orifice is capable of delivering vaporized liquid source materials such as: TEOS, DADBS, HMDS, TMCTS, TEAL, TEB, TEG, TEI, TMAL, TMB, TMG, TMI, TaCl5, DMEAA, Ti[OCH(CH3)2]4, TiCl4, TIBAL, and TMP.
1152C Heated Pressure-Based Mass Flow Controller
Laminar Flow for High Temperature Operation up to 150 degrees C
The MKS Instruments 1152C Vapor Source MFC is a pressure-based measurement and control system designed to meter and control vapor from low vapor pressure liquid and solid sources directly, without the need of a carrier gas.
The 1152C consists of a fixed flow element and two capacitance manometers for flow measurement, with a proportioning solenoid control valve for flow control (U.S. Patent No. 4,679,585). The 1152C contained within a compact temperature-controlled assembly with a temperature status LED and relay to indicate when temperature is in range.
The 1152C Heated Pressure-Based Mass Flow Controller using viscous flow through a laminar flow tube is capable of delivering vaporized liquid source materials such as: TEOS, DADBS, HMDS, TMCTS, TEAL, TEB, TEG, TEI, TMAL, TMB, TMG, TMI, TaCl5, DMEAA, Ti[OCH(CH3)2]4, TiCl4, TIBAL, and TMP.
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