Remote Plasma Sources
Remote Plasma Sources
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NF3 & Fluorine-based Gases
Plasma sources for NF3 and fluorine-based gases are a remote source for reactive gas to clean undesired deposits from interior walls of thin film deposition process chambers. By generating atomic fluorine that reacts with waste deposits in the chamber, new gases are formed that are readily scrubbed to minimize the environmental impact. In addition, the remote source reduces wear and tear on the process chamber as compared to in-situ RF methods.
Products
Paragon® AX7710MKS-01 Intelligent Remote Plasma Source (8 slm, NF3 flow)
ASTRON®ex AX7685 Remote Plasma Source (rated to 6.0 slm NF3 flow)
ASTRON®hf-s (split) AX7645 Remote Plasma Source (rated to 15.0 slm NF3 flow)
ASTRON®hf+ AX7635 Remote Plasma Source (rated to 22.0 slm NF3 flow)
ASTRON® G7 AX7667 High Flow Remote Plasma Source (rated 20-30 SLM of NF3 & 20-30 Torr pressure)
Visit MKS site for more information of these products.
O2, N2, H2, H2O
Plasma is an ionized gas essential in many processes such as photo-resist removal, wafer pre-clean, and thin film nitridation and oxidation. MKS designs and develops RF and microwave powered remote and in-situ sources for generation of oxygen, nitrogen, hydrogen and water vapor plasmas.
Products
Remote RF Plasma Sources
- R*evolution® V AX7696MKS-01 Remote Plasma Source (10 slm Oxygen flow)
- R*evolution® III AX7695 Remote RF Plasma Source
- Paragon® H* AX7780/AX7785 Remote Plasma Gas Generators for Hydrogen-based Processes
Downstream Plasma Sources
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Dimensions
Performance Curve
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