{"product_id":"process-sense-ndir","title":"Process Sense NDIR","description":"\u003ch3\u003eFeatures\u003c\/h3\u003e\n\u003cul\u003e\n\u003cli\u003eReduced chamber clean times\u003c\/li\u003e\n\u003cli\u003eReduced chamber clean cost\u003c\/li\u003e\n\u003cli\u003eMinimum particle events\u003c\/li\u003e\n\u003cli\u003eReduced NF3 usage\u003c\/li\u003e\n\u003cli\u003eReduced power consumption\u003c\/li\u003e\n\u003cli\u003eIncreased wafer throughput of CVD tool\u003c\/li\u003e\n\u003cli\u003eAccurate determination of chamber clean endpoint\u003c\/li\u003e\n\u003cli\u003eLow-cost filter-based analyzer\u003cbr\u003e\n\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ch3\u003eApplications\u003c\/h3\u003e\n\u003cul\u003e\n\u003cli\u003eChamber clean endpoint for SiF4\u003c\/li\u003e\n\u003cli\u003eSensitivity to SiF4 down to 1ppm\u003c\/li\u003e\n\u003cli\u003eSimple analog output for reported concentration signal\u003c\/li\u003e\n\u003cli\u003eSilicon Oxides (USG, FSG, PSG, BSG, BPSG)\u003c\/li\u003e\n\u003cli\u003eSilicon Nitrides\u003c\/li\u003e\n\u003cli\u003ePolysilicon\u003c\/li\u003e\n\u003cli\u003eSilane or TEOS processes\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0120\/5321\/7338\/files\/ProcessSenseDS.pdf?v=1620407487\" target=\"_blank\" rel=\"noopener\"\u003eDownload data sheet for more information\u003c\/a\u003e\u003c\/p\u003e","brand":"VACPRO - Vacuum Process Solutions","offers":[{"title":"Default Title","offer_id":57548024807806,"sku":null,"price":0.0,"currency_code":"GBP","in_stock":false}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0120\/5321\/7338\/files\/image_74_2cbbf2bb-0cbf-4745-bf61-9504f6ec59ad.png?v=1781506046","url":"https:\/\/vacpro.dk\/products\/process-sense-ndir","provider":"VACPRO - Vacuum Process Solutions","version":"1.0","type":"link"}