{"product_id":"atlas™","title":"Atlas™","description":"\u003ctable width=\"100%\" style=\"width: 100%;\"\u003e\n\u003ctbody\u003e\n\u003ctr\u003e\n\u003ctd style=\"width: 52.0211%;\"\u003e\n\u003ch2\u003eTechnical data\u003c\/h2\u003e\n\u003c\/td\u003e\n\u003ctd style=\"width: 47.6274%;\"\u003e\u003cbr\u003e\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd style=\"width: 52.0211%;\"\u003eProcess gas inlets \/ Bypass outlet :\u003c\/td\u003e\n\u003ctd style=\"width: 47.6274%;\"\u003eNW40 stainless steel\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd style=\"width: 52.0211%;\"\u003eAbatement system exhaust outlet :\u003c\/td\u003e\n\u003ctd style=\"width: 47.6274%;\"\u003e75 mm diameter polypropylene\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr\u003e\n\u003ctd style=\"width: 52.0211%;\"\u003eCabinet extraction outlet :\u003c\/td\u003e\n\u003ctd style=\"width: 47.6274%;\"\u003e150 mm diameter x 150 mm deep, painted mild steel\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/tbody\u003e\n\u003c\/table\u003e\n\u003ch4\u003e\u003cbr\u003e\u003c\/h4\u003e\n\u003ch4\u003eAtlas TCS\u003cbr\u003e\n\u003c\/h4\u003e\n\u003ch3\u003eOverView\u003c\/h3\u003e\n\u003cp\u003eEffective exhaust management of CVD processes must be able to handle the deposition gases and the associated powders. The fluoride wastes from cleaning gases also require suitable treatment along with global warming gases. Abatement systems must be able to comply with these requirements in one complete unit.\u003c\/p\u003e\n\u003cp\u003eThe Atlas TCS provides reliable, high performance, low cost abatement of flammable and acid gases from CVD exhausts. The Atlas TCS incorporates the unique inward-fired radiant combustor and high-efficiency multi-stage water scrubber developed for the Thermal Processing range and is ideally suited to the treatment of exhaust streams from CVD tools employing remote plasma NF3 cleans and high flows of F2.\u003c\/p\u003e\n\u003ch3\u003eFeatures and Benefits\u003c\/h3\u003e\n\u003cul\u003e\n\u003cli\u003eHigh performance, robust abatement Capable of removing pyrophoric and acid gases to below TLV\u003c\/li\u003e\n\u003cli\u003eSafe treatment of up to 20 slpm fluorine\u003c\/li\u003e\n\u003cli\u003eExcellent powder handling capabilities\u003c\/li\u003e\n\u003cli\u003eLow cost of ownership\u003c\/li\u003e\n\u003cli\u003eWater recirculation for reduced water usage\u003c\/li\u003e\n\u003cli\u003eFull tool interfacing for utilities conservation\u003c\/li\u003e\n\u003cli\u003eOEM recommended\u003c\/li\u003e\n\u003cli\u003eMaximized tool uptime\u003c\/li\u003e\n\u003cli\u003eLow thermal mass facilitates rapid servicing\u003c\/li\u003e\n\u003cli\u003eField proven, corrosion-resistant design\u003c\/li\u003e\n\u003cli\u003eSmall footprint\u003c\/li\u003e\n\u003cli\u003eSupported by global field service organisation\u003c\/li\u003e\n\u003cli\u003eThird-party certification\u003c\/li\u003e\n\u003cli\u003eSEMI S2, F15 certified, ETL Listed\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ch4\u003eAtlas TPU\u003c\/h4\u003e\n\u003ch3\u003eOverView\u003c\/h3\u003e\n\u003cp\u003eThe Atlas TPU is a world proven system and the semiconductor industry's standard abatement system for CVD. In one model, there is suitability for all CVD and Etch applications, enabling World Semiconductor Council PFC emission reduction targets to be met. Each inlet can be individually configured for the highest level of abatement of all PFC gases, Fluorine (F2) or Chlorine TriFluoride (ClF3).\u003c\/p\u003e\n\u003ch3\u003eFeatures and Benefits\u003c\/h3\u003e\n\u003cul\u003e\n\u003cli\u003eLow Cost of Ownership\u003c\/li\u003e\n\u003cli\u003eWater Recirculation Unit (WRU) ensures low water usage\u003c\/li\u003e\n\u003cli\u003eUnrivalled Abatement Performance\u003c\/li\u003e\n\u003cli\u003eIndependently verified\u003c\/li\u003e\n\u003cli\u003eProvides high flow, high performance, CF4 abatement\u003c\/li\u003e\n\u003cli\u003eCapable of treating high flows of ClF3\u003c\/li\u003e\n\u003cli\u003eRobust Field Performance\u003c\/li\u003e\n\u003cli\u003eCertified to SEMI S2, CE Marked and ETL Listed\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ch4\u003eAtlas Kronis\u003c\/h4\u003e\n\u003ch3\u003eOverView\u003c\/h3\u003e\n\u003cp\u003eEffective exhaust management of CVD processes must be able to handle the deposition gases and the associated powders. The fluoride wastes from cleaning gases also require suitable treatment along with global warming gases. Abatement systems must be able to comply with these requirements in one complete unit.\u003cbr\u003e\u003c\/p\u003e\n\u003cp\u003eAchieving clean combustion of low k organosilane precursors is challenging, and failure to do so results in unacceptable by-products and blockages in downstream systems. Ultimately such blockages can cause unscheduled downtime. Edwards has gained an in-depth understanding of low k CVD process issues by working extensively with OEMs and materials suppliers during process development.\u003c\/p\u003e\n\u003ch3\u003eFeatures and Benefits\u003cbr\u003e\n\u003c\/h3\u003e\n\u003cul\u003e\n\u003cli\u003eHigh performance abatement\u003c\/li\u003e\n\u003cli\u003eDestroys all low k CVD precursors and clean species simultaneously\u003c\/li\u003e\n\u003cli\u003eComplete reaction eliminates clogging issues\u003c\/li\u003e\n\u003cli\u003eEnvironmental and health and safety compliance assured\u003c\/li\u003e\n\u003cli\u003eExtensive OEM qualification program\u003c\/li\u003e\n\u003cli\u003eLow cost of ownership\u003c\/li\u003e\n\u003cli\u003eControlled, cost-effective combustion\u003c\/li\u003e\n\u003cli\u003eOption to run on compressed dry air\u003c\/li\u003e\n\u003cli\u003eWater recirculation reduces water usage\u003c\/li\u003e\n\u003cli\u003eMaximised tool uptime\u003c\/li\u003e\n\u003cli\u003eExcellent handling of high powder volumes\u003c\/li\u003e\n\u003cli\u003eField-proven, corrosion-resistant design for chamber cleaning gases\u003c\/li\u003e\n\u003cli\u003eSupported by Edwards’ global service team for unrivalled field reliability\u003c\/li\u003e\n\u003cli\u003eEnhanced wafer security\u003c\/li\u003e\n\u003cli\u003ePLC Controlled, tool interfacing and full system monitoring\u003c\/li\u003e\n\u003cli\u003eThird-party certification\u003c\/li\u003e\n\u003cli\u003eSEMI S2, F15 certified, ETL listed\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ch4\u003eAtlas Helios\u003c\/h4\u003e\n\u003ch3\u003eOverView\u003c\/h3\u003e\n\u003cp\u003eEffective exhaust management of CVD processes must be able to handle the deposition gases and the associated powders. The fluoride wastes from cleaning gases also require suitable treatment along with global warming gases. Abatement systems must be able to comply with these requirements in one complete unit.\u003c\/p\u003e\n\u003ch3\u003eFeatures and Benefits\u003cbr\u003e\n\u003c\/h3\u003e\n\u003cul\u003e\n\u003cli\u003eProven high abatement performance for toxic, pyrophoric \u0026amp; corrosive gases\u003c\/li\u003e\n\u003cli\u003eReliable handling of associated powders\u003c\/li\u003e\n\u003cli\u003eControlled and complete oxidation of hydrogen to safe limits\u003c\/li\u003e\n\u003cli\u003eCapable of handling up to 200 lpm of hydrogen\u003c\/li\u003e\n\u003cli\u003eUp to 4 process inlets\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ch4\u003eAtlas Etch\u003c\/h4\u003e\n\u003ch3\u003eOverView\u003c\/h3\u003e\n\u003cp\u003eAbatement solution for Generation 5, 6 and 7 Flat Panel Etch Processes\u003c\/p\u003e\n\u003cp\u003e\u003cstrong\u003eApplication challenges\u003c\/strong\u003e\u003c\/p\u003e\n\u003cp\u003eModern FPD (Flat Panel Display) Etch processes combine the use of large PFC gases flows (typically SF6 and\/or CF4) with large flows of Chlorine (Cl2) and Hydrochloric acid (HCl). A generation 6 etch process tool will typically combine 12slm of SF6 and\/or 8slm of CF4, with 15slm of Cl2 or 15slm HCl. Combustion abatement methods are faced with three challenges: the combustion of large PFC gas flows (PFCs are extremely stable chemical compounds), in the presence of large Cl2 flows (chlorine acts as a flame-suppressant), and the management of acidic by-products (HCl, HF, H2SO4 and SO2).\u003c\/p\u003e\n\u003cp\u003eAtlas Etch has successfully met with all three challenges. Optimisation of the combustion process and smart management of the gas input enable destruction and removal efficiencies (DREs) greater than 99% for SF6 and greater than 90% for CF4, even in the presence of Chlorine. The use of corrosion resistant materials in the design of the wet scrubbing stages ensures that Atlas Etch can remove acidic by-products reliably whilst maintaining low water consumption and high process uptime.\u003c\/p\u003e\n\u003ch3\u003eFeatures and Benefits\u003cbr\u003e\n\u003c\/h3\u003e\n\u003cul\u003e\n\u003cli\u003eProven high abatement performance for toxic, pyrophoric \u0026amp; corrosive gases\u003c\/li\u003e\n\u003cli\u003eReliable handling of associated powders\u003c\/li\u003e\n\u003cli\u003eControlled and complete oxidation of hydrogen to safe limits\u003c\/li\u003e\n\u003cli\u003eCapable of handling up to 200 lpm of hydrogen\u003c\/li\u003e\n\u003cli\u003eUp to 4 process inlets\u003c\/li\u003e\n\u003c\/ul\u003e","brand":"VACPRO - Vacuum Process Solutions","offers":[{"title":"Default Title","offer_id":57523665404286,"sku":null,"price":0.0,"currency_code":"GBP","in_stock":false}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0120\/5321\/7338\/files\/image_59.png?v=1780895466","url":"https:\/\/vacpro.dk\/products\/atlas%e2%84%a2","provider":"VACPRO - Vacuum Process Solutions","version":"1.0","type":"link"}