{"title":"MKS Instruments","description":"\u003cp\u003eMKS Instruments, Inc. is a global provider of instruments, subsystems and process control solutions that measure, control, power, monitor and analyze critical parameters of advanced manufacturing processes to improve process performance and productivity. Our products are derived from our core competencies in pressure measurement and control, materials delivery, gas composition analysis, control and information technology, power and reactive gas generation, vacuum technology, photonics, lasers, optics and motion control. Our primary served markets are manufacturers of capital equipment for thin film including semiconductor devices, process manufacturing, environmental, life sciences and scientific research.\u003c\/p\u003e","products":[{"product_id":"rf-dc-power","title":"RF \u0026 DC Power","description":"\u003ch4\u003eDC Power Generators\u003cbr\u003e\n\u003c\/h4\u003e\n\u003cp\u003eDC Power Supplies and DC Power Generators\u003c\/p\u003e\n\u003cp\u003eMKS RPDG generators provide asymmetric bipolar and unipolar pulsed DC power for reactive PVD (Physical Vapor Deposition), CVD (Chemical Vapor Deposition) bias and enhancement coating applications. The RPDG line eliminates yield-limiting factors, thus enabling existing PVD tools to produce the high quality, low-defect films needed for next generation processes.\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.mks.com\/product\/Product.aspx?ProductID=318\" rel=\"noopener\" target=\"_blank\"\u003e\u003cstrong\u003eRPDG-50 5kW Pulsed DC Plasma Generator\u003c\/strong\u003e\u003c\/a\u003e\u003c\/p\u003e\n\u003cul\u003e\n\u003cli\u003eAsymmetric bipolar and unipolar DC power in a single unit (3U)\u003c\/li\u003e\n\u003cli\u003eProgrammable frequency, and duty cycle.\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.mks.com\/product\/Product.aspx?ProductID=319\" rel=\"noopener\" target=\"_blank\"\u003e\u003cstrong\u003eRPDG-100 10kW Pulsed DC Plasma Generator\u003c\/strong\u003e\u003c\/a\u003e\u003c\/p\u003e\n\u003cul\u003e\n\u003cli\u003eAsymmetric bipolar and unipolar DC power in a single unit (3U)\u003c\/li\u003e\n\u003cli\u003eProgrammable frequency, and duty cycle.\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.mks.com\/product\/Product.aspx?ProductID=800\" rel=\"noopener\" target=\"_blank\"\u003e\u003cstrong\u003eRPDG-200 20kW Pulsed DC Plasma Generator\u003c\/strong\u003e\u003c\/a\u003e\u003c\/p\u003e\n\u003cul\u003e\n\u003cli\u003eAsymmetric bipolar and unipolar DC power\u003c\/li\u003e\n\u003cli\u003eProgrammable frequency, and duty cycle.\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ch4\u003eRF Power Generators\u003cbr\u003e\n\u003c\/h4\u003e\n\u003cp\u003eRF Generator Products with Precise DSP-based Power Control\u003c\/p\u003e\n\u003cp\u003eMKS RF Power Generators provide reliable solid state power for thin films processing equipment. They are vital components of semiconductor fabrication systems, which produce the integrated circuits (ICs) or chips required by modern computers and electronic equipment. MKS RF Generators, combined with our Impedance Matching Network and our V\/I Probe form a complete RF Delivery System.\u003c\/p\u003e\n\u003cp\u003eDynamic Frequency Tuning (DFT) is now available as an option for select MKS RF Plasma Generators. DFT provides near instantaneous impedance tuning and coupled with Advanced Pulsing, accurate power detection with integrated VI Probe provides the most technically advanced product for IC manufacturing.\u003c\/p\u003e\n\u003ch3\u003eProducts\u003c\/h3\u003e\n\u003cp\u003e\u003cstrong\u003e2MHz RF Plasma Generators\u003c\/strong\u003e\u003c\/p\u003e\n\u003cul\u003e\n\u003cli\u003e\u003ca href=\"https:\/\/www.mks.com\/product\/Product.aspx?ProductID=244\" rel=\"noopener\" target=\"_blank\"\u003eKEINOS™ 2MHz 5kW, 11kW \u0026amp; 13kW RF Plasma Generators\u003c\/a\u003e\u003c\/li\u003e\n\u003cli\u003e\u003ca href=\"https:\/\/www.mks.com\/product\/Product.aspx?ProductID=304\" rel=\"noopener\" target=\"_blank\"\u003eNOVA® 2 MHz 2.5kW \u0026amp; 5.0kW RF Plasma Generators\u003c\/a\u003e\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e\u003cstrong\u003e13.56MHz RF Plasma Generators\u003c\/strong\u003e\u003c\/p\u003e\n\u003cul\u003e\n\u003cli\u003e\u003ca href=\"https:\/\/www.mks.com\/product\/Product.aspx?ProductID=1173\" rel=\"noopener\" target=\"_blank\"\u003eGHW Series 13.56 MHz, 1.25, 2.5, and 5.0 kW, High-Reliability RF Plasma Generators\u003c\/a\u003e\u003c\/li\u003e\n\u003cli\u003e\u003ca href=\"https:\/\/www.mks.com\/product\/Product.aspx?ProductID=1347\" rel=\"noopener\" target=\"_blank\"\u003eelite™ Series 750, 600, \u0026amp; 300 Watt, 13.56 MHz, RF Plasma Generators\u003c\/a\u003e\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003eVisit MKS site for more information of these products.\u003c\/p\u003e","brand":"VACPRO - Vacuum Process Solutions","offers":[{"title":"Default Title","offer_id":57548019007870,"sku":null,"price":0.0,"currency_code":"GBP","in_stock":false}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0120\/5321\/7338\/files\/image-2026-06-15T114935.749.png?v=1781504383"},{"product_id":"remote-plasma-sources","title":"Remote Plasma Sources","description":"\u003ch4\u003eNF3 \u0026amp; Fluorine-based Gases\u003cbr\u003e\n\u003c\/h4\u003e\n\u003cp\u003ePlasma sources for NF3 and fluorine-based gases are a remote source for reactive gas to clean undesired deposits from interior walls of thin film deposition process chambers. By generating atomic fluorine that reacts with waste deposits in the chamber, new gases are formed that are readily scrubbed to minimize the environmental impact. In addition, the remote source reduces wear and tear on the process chamber as compared to in-situ RF methods.\u003c\/p\u003e\n\u003ch3\u003eProducts\u003c\/h3\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.mks.com\/product\/Product.aspx?ProductID=1632\" target=\"_blank\" rel=\"noopener\"\u003eParagon® AX7710MKS-01 Intelligent Remote Plasma Source (8 slm, NF3 flow)\u003c\/a\u003e\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.mks.com\/product\/Product.aspx?ProductID=1366\" target=\"_blank\" rel=\"noopener\"\u003eASTRON® Paragon® AX7700 \u0026amp; AX7710 Reactive Gas Source Platform for New Process Applications (rated to 6.0 slm NF3 flow)\u003c\/a\u003e\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.mks.com\/product\/Product.aspx?ProductID=294\" target=\"_blank\" rel=\"noopener\"\u003eASTRON®ex AX7685 Remote Plasma Source (rated to 6.0 slm NF3 flow)\u003c\/a\u003e\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.mks.com\/product\/Product.aspx?ProductID=295\" target=\"_blank\" rel=\"noopener\"\u003eASTRON®hf-s (split) AX7645 Remote Plasma Source (rated to 15.0 slm NF3 flow)\u003c\/a\u003e\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.mks.com\/product\/Product.aspx?ProductID=1236\" target=\"_blank\" rel=\"noopener\"\u003eASTRON®hf+ AX7635 Remote Plasma Source (rated to 22.0 slm NF3 flow)\u003c\/a\u003e\u003c\/p\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/www.mks.com\/product\/Product.aspx?ProductID=1379\" target=\"_blank\" rel=\"noopener\"\u003eASTRON® G7 AX7667 High Flow Remote Plasma Source (rated 20-30 SLM of NF3 \u0026amp; 20-30 Torr pressure)\u003c\/a\u003e\u003c\/p\u003e\n\u003cp\u003eVisit MKS site for more information of these products.\u003c\/p\u003e\n\u003ch4\u003eO2, N2, H2, H2O\u003cbr\u003e\n\u003c\/h4\u003e\n\u003cp\u003ePlasma is an ionized gas essential in many processes such as photo-resist removal, wafer pre-clean, and thin film nitridation and oxidation. MKS designs and develops RF and microwave powered remote and in-situ sources for generation of oxygen, nitrogen, hydrogen and water vapor plasmas.\u003c\/p\u003e\n\u003ch3\u003eProducts\u003c\/h3\u003e\n\u003cp\u003e\u003cstrong\u003eRemote RF Plasma Sources\u003c\/strong\u003e\u003c\/p\u003e\n\u003cul\u003e\n\u003cli\u003e\u003ca href=\"https:\/\/www.mks.com\/product\/Product.aspx?ProductID=1633\" target=\"_blank\" rel=\"noopener\"\u003eR*evolution® V AX7696MKS-01 Remote Plasma Source (10 slm Oxygen flow)\u003c\/a\u003e\u003c\/li\u003e\n\u003cli\u003e\u003ca href=\"https:\/\/www.mks.com\/product\/Product.aspx?ProductID=47\" target=\"_blank\" rel=\"noopener\"\u003eR*evolution® III AX7695 Remote RF Plasma Source\u003c\/a\u003e\u003c\/li\u003e\n\u003cli\u003e\u003ca href=\"https:\/\/www.mks.com\/product\/Product.aspx?ProductID=1506\" target=\"_blank\" rel=\"noopener\"\u003eParagon® H* AX7780\/AX7785 Remote Plasma Gas Generators for Hydrogen-based Processes\u003c\/a\u003e\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e\u003cstrong\u003eDownstream Plasma Sources\u003c\/strong\u003e\u003c\/p\u003e\n\u003cul\u003e\n\u003cli\u003e\u003ca href=\"https:\/\/www.mks.com\/product\/Product.aspx?ProductID=1618\" target=\"_blank\" rel=\"noopener\"\u003eHigh Power Microwave Plasma Source\u003c\/a\u003e\u003c\/li\u003e\n\u003cli\u003e\u003ca href=\"https:\/\/www.mks.com\/product\/Product.aspx?ProductID=1385\" target=\"_blank\" rel=\"noopener\"\u003eAX7610 Chemical Downstream Plasma Source\u003c\/a\u003e\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003eVisit MKS site for more information of these products.\u003c\/p\u003e","brand":"VACPRO - Vacuum Process Solutions","offers":[{"title":"Default Title","offer_id":57548066292094,"sku":null,"price":0.0,"currency_code":"GBP","in_stock":false}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0120\/5321\/7338\/files\/image-2026-06-15T125907.151.png?v=1781508553"},{"product_id":"reactive-gas","title":"Reactive Gas","description":"\u003ch4\u003eDissolved CO2\u003cbr\u003e\n\u003c\/h4\u003e\n\u003cp\u003eCompact Carbonated Ultrapure Water Delivery System\u003c\/p\u003e\n\u003cp\u003eThe DI-SOLVER CO2 is used in single substrate cleaning tools for rinsing steps to prevent ESD effects and\/or corrosion by creating UPW (ultrapure water) with precisely defined conductivity. It is a compact system for tool integration, providing conductive DI-CO2 water (carbonated ultra-pure water) with closed loop controlled conductivity. The conductivity is kept at a constant value under changing flow conditions by control of the CO2 concentration in the DI-CO2 water..\u003c\/p\u003e\n\u003ch3\u003eFeatures\u003c\/h3\u003e\n\u003cul\u003e\n\u003cli\u003eClosed-loop conductivity control\u003c\/li\u003e\n\u003cli\u003eSmall, compact module for integration\u003c\/li\u003e\n\u003cli\u003eLow cost of ownership, no CO2 and no UPW consumption at process pauses\u003c\/li\u003e\n\u003cli\u003eMaximum conductivity at physical limits\u003c\/li\u003e\n\u003cli\u003eHighest accuracy\u003c\/li\u003e\n\u003cli\u003eFlow is allowed to change between 0.5 - 90 L\/min to keep conductivity stable (up to ± 3%)\u003c\/li\u003e\n\u003cli\u003eMaintenance-free contactor\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ch3\u003eApplications\u003c\/h3\u003e\n\u003cul\u003e\n\u003cli\u003eSeveral process steps in the semiconductor industry require de-ionized (DI) water with precisely defined conductivity. The DI-SOLVER CO2 meets this demand.\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003e\u003ca href=\"https:\/\/cdn.shopify.com\/s\/files\/1\/0120\/5321\/7338\/files\/DI-SOLVER-DS.pdf?v=1620407492\" target=\"_blank\" rel=\"noopener\"\u003eDownload data sheet for more information\u003c\/a\u003e\u003c\/p\u003e\n\u003ch4\u003eOzone\u003cbr\u003e\n\u003c\/h4\u003e\n\u003cp\u003eMKS offers a complete spectrum of ultra clean, highly reliable ozone generation, delivery and accessory products. The ozone product family includes compact, high concentration ozone generators, closed-loop controlled ozone gas delivery subsystems, state-of-the-art, high concentration dissolved ozone liquid delivery subsystems and ozone accessories for flow mixing and ozone destruction.\u003c\/p\u003e\n\u003ch3\u003eCategories\u003c\/h3\u003e\n\u003cul\u003e\n\u003cli\u003eDissolved Ozone Delivery Systems\u003c\/li\u003e\n\u003cli\u003eOzone Gas Generators\u003c\/li\u003e\n\u003cli\u003eOzone Gas Delivery Systems\u003c\/li\u003e\n\u003cli\u003eOzone Sanitization\u003c\/li\u003e\n\u003cli\u003eAccessories for Ozone Products\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp\u003eVisit MKS site for more information of these products.\u003c\/p\u003e","brand":"VACPRO - Vacuum Process Solutions","offers":[{"title":"Default Title","offer_id":57548097945982,"sku":null,"price":0.0,"currency_code":"GBP","in_stock":false}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0120\/5321\/7338\/files\/image-2026-06-15T130651.750.png?v=1781509018"},{"product_id":"microwave","title":"Microwave","description":"\u003ch2\u003eSemiconductor Microwave Plasma Processing\u003c\/h2\u003e\n\u003cp\u003eRemote microwave plasma disassociates a wide range of semiconductor process gases to their atomic form. Applications include hydrogen for native oxide etch, fluorine for silicon etch, oxygen and nitrogen for oxidation and nitration to increase the dielectric constant of gate oxides. Atomic oxygen is widely used for high-rate, damage-free photoresist removal, and atomic fluorine effectively eliminates hard photoresist. Water vapor plasma successfully removes residue and aids post-metal etch passivation. With high selectivity and minimal dielectric damage, microwave plasma strip processes meet the cleanliness and residue removal requirements of fine device architectures, high aspect ratios and new low-k materials. An ion-depleted downstream microwave plasma has proven superior for achieving a pure dry chemical process and in dual-damascene low-k processes.\u003c\/p\u003e\n\u003cp\u003eIn remote microwave plasma subsystems, the plasma discharge is used to dissociate process gases and produce active atoms (radicals) upstream of the process chamber. Remote microwave plasma subsystems produce a low content of energetic ions. Therefore, the flow of radicals generated in the microwave plasma source can be used for damage-free wafer processing.\u003c\/p\u003e\n\u003ch2\u003eIndustrial, Food and Beverage, Medical and other Microwave Processing\u003c\/h2\u003e\n\u003cp\u003eMicrowave is a fast and efficient method of heating materials that are difficult to heat by convection or infrared methods, and unlike other types of heating, microwaves penetrate all parts of the material concurrently, so they heat uniformly. Microwave technology is used in numerous applications including:\u003c\/p\u003e\n\u003cul\u003e\n\u003cli\u003eHeating and Drying of lumber, paper, foods, drugs, etc.\u003c\/li\u003e\n\u003cli\u003eMaterials Processing of polymers, textiles, non-wovens, etc.\u003c\/li\u003e\n\u003cli\u003eSintering and brazing of ceramics\u003c\/li\u003e\n\u003cli\u003eCuring and cross linking of polymers\u003c\/li\u003e\n\u003cli\u003eSurface modification, nitridation, passivation, oxidation\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003ch2\u003eProducts\u003c\/h2\u003e\n\u003cul\u003e\n\u003cli\u003eIntegrated Microwave Plasma Subsystems\u003c\/li\u003e\n\u003cli\u003eMicrowave Generators\u003c\/li\u003e\n\u003cli\u003eMicrowave Plasma Sources\u003c\/li\u003e\n\u003cli\u003eMicrowave Components\u003c\/li\u003e\n\u003cli\u003eAccessories for Microwave Products\u003cbr\u003e\n\u003c\/li\u003e\n\u003c\/ul\u003e","brand":"VACPRO - Vacuum Process Solutions","offers":[{"title":"Default Title","offer_id":57548105351550,"sku":null,"price":0.0,"currency_code":"GBP","in_stock":false}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0120\/5321\/7338\/files\/image-2026-06-15T131334.093.png?v=1781509420"}],"url":"https:\/\/vacpro.dk\/collections\/mks-instruments.oembed","provider":"VACPRO - Vacuum Process Solutions","version":"1.0","type":"link"}